Substrate apparatus calibration and synchronization procedure

ABSTRACT

A method for positioning substrates in a substrate processing apparatus having a substrate alignment device, a first substrate transport apparatus and a second substrate transport apparatus, includes calibrating the substrate alignment device with a motion of the first substrate transport apparatus, and calibrating a coordinate system of the second substrate transport apparatus with the substrate alignment device.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority to U.S. patent application Ser. No.10/613,697, filed Jul. 3, 2003 which is hereby incorporated by referenceherein in its entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a substrate processing system and, moreparticularly, to the calibration and synchronization of components ofthe system.

2. Brief Description of Related Developments

Substrate processing equipment is typically capable of performingmultiple operations on a substrate. U.S. Pat. No. 4,951,601 discloses asubstrate processing apparatus with multiple processing chambers and asubstrate transport apparatus. The substrate transport apparatus movessubstrates among the processing chambers where different operations,such as sputtering, etching, coating, soaking, etc., are performed.Production processes used by semiconductor device manufacturers andmaterial producers often require precise positioning of substrates inthe substrate processing equipment. U.S. Pat. No. 5,931,626 disclosesthat a substrate transport robot may be taught the locations of theprocessing chambers and other components of the substrate processingsystem by providing the robot with the dimensions of the system and thecomponents relative to the robot. One method of providing thesedimensions is to manually move the end effectors of the robot tospecific locations, record the movements, and “playback” the movementsduring processing operations.

However, this method of determining the locations of the systemcomponents is error prone. Measurement of the system dimensions andmanual manipulations of the robot may be subject to human error. Theprecise location of system components may change slightly due toenvironmental changes, for example temperature and humidity fluctuationsthat may cause dimensional changes in parts of the system. In addition,seals, support structures, and other parts of the system may be subjectto various types of stress, such as compression, and may change shapeslightly over time in response. These factors, separately or in anycombination, may affect the positioning of substrates within thesubstrate processing system.

It would be beneficial to provide a technique to correct for errors andchanges in component locations, and to provide for more exactpositioning of substrates in substrate processing equipment.

SUMMARY OF THE INVENTION

In one embodiment of the present invention, a method for positioningsubstrates in a substrate processing apparatus having a substratealignment device, a first substrate transport apparatus and a secondsubstrate transport apparatus includes calibrating the substratealignment device with a motion of the first substrate transportapparatus, and calibrating a coordinate system of the second substratetransport apparatus with the substrate alignment device.

In another embodiment, a computer program product includes a computeruseable medium having computer readable code embodied therein forcausing a computer to position substrates in a substrate processingapparatus. The computer readable code includes code for causing acomputer to calibrate a substrate alignment device with a motion of afirst substrate transport apparatus, and code for causing a computer tocalibrate a coordinate system of a second substrate transport apparatuswith the substrate alignment device.

BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing aspects and other features of the invention are explainedin the following description, taken in connection with the accompanyingdrawings, wherein:

FIG. 1 is a schematic top plan view of a substrate apparatusincorporating the features of the present invention;

FIG. 2 is a diagrammatic perspective view of example embodiments of analigner and an atmospheric substrate transport apparatus in accordancewith the prior art;

FIG. 3 is a schematic diagram of an example embodiment of an alignerincorporating the features of the present invention;

FIG. 4 is a diagram of an example embodiment of a vacuum substratetransport apparatus incorporating the features of the present invention;

FIG. 5 is a flow diagram for adjusting the calibration factor for thealigner;

FIG. 6 is a flow diagram for synchronizing the coordinate system of thealigner with the coordinate system of arm A of the second substratetransport apparatus;

FIG. 7 is a flow diagram for synchronizing the coordinate system of thealigner with the coordinate system of arm B of the second substratetransport apparatus;

FIG. 8 is a flow diagram for synchronizing coordinates for load locks inthe system, stored for arm A of the second substrate transportapparatus;

FIG. 9 is a flow diagram for synchronizing coordinates for load locks inthe system, stored for arm B of the second substrate transportapparatus;

FIG. 10 is a flow diagram for correcting coordinates for processingmodules in the system, stored for arm A of the second substratetransport apparatus; and

FIG. 11 is a flow diagram for correcting coordinates for processingmodules in the system, stored for arm B of the second substratetransport apparatus.

DETAILED DESCRIPTION OF THE EMBODIMENT(S)

Referring to FIG. 1, there is shown a top view of a substrate processingapparatus 100 incorporating features of the present invention. Substrateprocessing apparatus 100 generally has an atmospheric section 105, whichis open to the atmosphere, and an adjoining vacuum section 110, which isequipped to function as a vacuum chamber.

Atmospheric section 105 typically has one or more substrate holdingcassettes 115, and an atmospheric substrate transport apparatus 120.Vacuum section 110 has one or more processing modules 125, and a vacuumsubstrate transport apparatus 130. Vacuum section 110 also has one ormore intermediate chambers, referred to as load locks. The embodimentshown in FIG. 1 has two load locks, load lock A 135, and load lock B140. Load locks A and B operate as interfaces, allowing substrates topass between atmospheric section 105 and vacuum section 110 withoutviolating the integrity of any vacuum that may be present in vacuumsection 110. Substrate processing apparatus 100 also includes acontroller 170 that controls the operation of substrate processingapparatus 100. Controller 170 has a processor and a memory 178. Memory178 may include operating system programs including a correctiontechnique in accordance with the present invention.

As shown, controller 170 is connected to substrate processing system 100through link 183. Link 183 may be any communications link capable ofsupporting communication between controller 170 and substrate processingsystem 100. Link 183 may include the PSTN, the internet, a wirelessnetwork, a wired network, and may further include other types ofnetworks including X.25, TCP/IP, ATM, etc.

Controller 170 is generally adapted to read information from a computerprogram product, for example, a computer useable medium, or a programstorage device, that may include computer readable code. The programstorage device may include a diskette, a computer hard drive, a compactdisk (CD), a digital versatile disk (DVD), an optical disk, a read onlymemory (ROM), a chip, a semiconductor, or any other device capable ofstoring computer readable code.

Atmospheric section 105 may have two substrate holding cassettes 115.Substrate holding cassettes 115 may be arranged in a generally side byside configuration. Substrate holding cassettes 115 may be front openinguniform pods (FOUP) which in one embodiment are capable of holdingapproximately 26 substrates. In alternate embodiments, atmosphericsection 105 may support any desired number of substrate holdingcassettes 115. Substrate holding cassettes 115 may be of any suitabletype and be capable of holding any desired number of substrates.

For purposes of this invention a substrate may be for example, asemiconductor wafer (e.g. a 200 mm or 300 mm wafer), a flat paneldisplay substrate, any other type of substrate suitable for processingby substrate processing apparatus 100, a blank substrate, or a articlehaving characteristics similar to a substrate, such as certaindimensions or a particular mass.

Atmospheric substrate transport apparatus 120 is mounted to atmosphericsection 105 between substrate holding cassettes 115 and vacuum section110. Atmospheric substrate transport apparatus 120 may also be referredto as ATM robot 120. FIG. 2 shows one embodiment of ATM robot 120. ATMrobot 120 has a drive section 150 and one or more arms 155. At least onearm 155 may be mounted onto drive section 150. At least one arm 155 iscoupled to a wrist 160 which in turn is coupled to an end effector 165for holding a substrate 215. End effector 165 is rotatably coupled towrist 160.

Returning to FIG. 1, in an alternate embodiment, ATM robot 120 may bemounted on a carriage (not shown) movably attached to atmosphericsection 105 so that ATM robot 120 may translate longitudinally orlaterally relative to atmospheric section 105. ATM robot 120 is adaptedto transport substrates to any location within atmospheric section 105.For example, ATM robot 120 may transport substrates among substrateholding cassettes 115, aligner 145, load lock A 135, and load lock B140. Drive section 150 receives commands from controller 170 and, inresponse, directs radial, circumferential and elevational motions of ATMrobot 120.

Commonly assigned U.S. Pat. No. 5,102,280, incorporated by reference inits entirety, discloses an example of such a substrate transportapparatus.

In other embodiments, ATM robot 120 may be any other suitable type oftransport apparatus, for example, a SCARA robot, an articulating armrobot, a frog leg type apparatus, or a bi-symmetric transport apparatus.

Substrate processing apparatus 100 also has an aligner 145, for placinga substrate in a known position in relationship to other components ofsubstrate processing apparatus 100. By placing the substrate in a knownposition, the substrate may be manipulated and transported by ATM robot120 and vacuum substrate transport apparatus 130 for delivery to apredetermined location within substrate processing apparatus 100 with apredetermined alignment. Aligner 145 may be located in atmosphericsection 105, in vacuum section 110, or anywhere within substrateprocessing apparatus 100, and may be accessed by ATM robot 120 and/orvacuum substrate transport apparatus 130. In the embodiment shown inFIG. 1, aligner 145 is located in atmospheric section 105, and isaccessible by ATM robot 120.

An example embodiment of aligner 145 is shown in FIG. 3. Aligner 145includes a supporting chuck 200, a radiation sensor 205, a radiationsource 210, and control circuitry 225. In this embodiment, radiationsensor 205 is a CCD array having a number of pixels, and radiationsource produces radiation that is detected by the pixels of radiationsensor 205. Also as part of this embodiment, control circuitry 225includes a processor 300 and memory 305. Processor 300 controlsradiation source 210, radiation sensor 205, and supporting chuck 200 inaccordance with parameters stored in memory 305. Memory 305 includes atleast one parameter, referred to as a calibration factor 310. Oneexample of calibration factor 310 is embodied as a number of pixels ofradiation sensor 205 spanning a linear dimension, for example, 418pixels per 2540 microns.

As part of an alignment procedure, a substrate 215 is placed onsupporting chuck 200 by end effector 165 of ATM robot 120. In an idealsituation, if substrate 215 is in alignment, that is, in a knownposition in relationship to other components of substrate processingapparatus 100, a centroid 240 of substrate 215 corresponds to an 15 axisof rotation 235 of supporting chuck 200. Radiation source 210 directsradiation represented by arrows 220 towards radiation sensor 205 in adirection perpendicular to a plane of substrate 215. Radiation that isnot obstructed by substrate 215 impinges on radiation sensor 205. Underdirection of control circuitry 225, supporting chuck 200 is rotatedabout axis 235 and radiation sensor 225 senses features of a peripheraledge 230 of substrate 215 including the location of a fiducial 245.After sensing the features of peripheral edge 230, aligner 145 rotatesthe substrates fiducial to a user defined post position. Using thefeatures of peripheral edge 230, control circuitry 225 determines thecentroid 240 of substrate 215 and determines an amount of misalignmentbetween centroid 240 and rotation axis 235. In another embodiment,control circuitry 225 determines an amount of linear misalignment interms of an eccentricity distance e_(D) and an amount of angularmisalignment in terms of an eccentricity angle e_(θ) (shown in FIG. 2).The eccentricity distance e_(D) and eccentricity angle e_(θ) areconveyed to ATM robot 120 which then repositions substrate 215 onsupporting chuck 200 so that it is in alignment. Alternatively, ATMrobot 120 utilizes eccentricity distance e_(D) and eccentricity anglee_(θ) as known offsets and compensates for these offsets whentransporting substrate 215 to a desired location within substrateprocessing apparatus 100.

In addition to the above described alignment procedure, aligner 145 isalso capable of performing a scan procedure. The scan procedure isessentially the same as the alignment procedure except that, aftersensing the features of peripheral edge 230, aligner 145 simply stopsand does not rotate the fiducial to a user defined post position.

An example of such an aligner is found in commonly assigned U.S. Pat.No. 6,195,619, which is incorporated by reference in its entirety.

Returning to FIG. 1, vacuum section 110 has a central chamber 175 whichmay be maintained substantially at a vacuum to prevent contamination ofsubstrates while being transported among processing modules 126, loadlock A 135, or load lock B 140.

It should be understood that central chamber 175 may contain any otherdesired atmosphere for processing one or more substrates 215. Vacuumsection 110 may include appropriate systems and plumbing (not shown) forgenerating, and maintaining the desired atmosphere in central chamber175. For example, a vacuum pump (not shown) may be mounted to vacuumsection 110 and connected to central chamber 175 using suitable plumbingto draw a desired vacuum condition in central chamber 175. The vacuumpump may be regulated by controller 170 using appropriate monitoringdevices (not shown) such as pressure gages.

Processing modules 125 are disposed generally around the periphery ofcentral chamber 175 and communicate with central chamber 175 throughopenings 180. Load lock A 135 and load lock B 140 communicate withcentral chamber 175 through openings 185. Openings 180, 185 compriseslot valves, solenoid valves, hydraulic valves, or any other suitablevalves that are capable of being individually opened and closed, andthat when closed, form a substantially airtight seal between the centralchamber and the corresponding processing module or load lock. Openings180, 185 are cycled between the open and closed position by controller170, and send a suitable signal to controller 170 to indicate theirposition.

Each processing module 125 may include one or more systems forprocessing substrates, for example, sputtering, coating, etching,soaking, or any other suitable process for substrates deposited in therespective processing modules. Each processing module 125 may alsoinclude additional openings (not shown) that allow communication withother equipment, or substrate processing by other equipment. Vacuumsubstrate transport apparatus 130 is mounted in central chamber 175.Vacuum substrate transport apparatus 130 is also referred to as VACrobot 130. Controller 170 cycles openings 180, 185 and coordinates theoperation of VAC robot 130 for transporting substrates among processingmodules 125, load lock A 135, and load lock B 140.

VAC robot 130 includes a drive section 190 and one or more end effectors195. One embodiment of VAC robot 130 is described in U.S. Pat. No.5,180,276, incorporated by reference in its entirety, and shown in FIG.4. In this embodiment, VAC robot 130 has a primary end effector 400coupled to primary forearms 405, 410. VAC robot 130 also has a secondaryend effector 415 coupled to secondary, forearms 420, 425. Primaryforearm 405 and secondary forearm 420, are coupled to a first rotatingarm 430. Primary forearm 410 and secondary forearm 425 are coupled to asecond rotating arm 435. First rotating arm 430 and second rotating arm435 are coupled to drive section 190. Primary end effector 400 andprimary forearms 405, 410 are collectively referred to as arm A, whilesecondary end effector 415 and secondary forearms 420, 425 arecollectively referred to a arm B. Drive section 190 is capable ofcausing first rotating arm 430 and second rotating arm 435 to rotatetoward primary end effector 400, thus causing arm A to extend and arm Bto retract. Drive section 190 is also capable of causing first rotatingarm 430 and second rotating arm 435 to rotate toward secondary endeffector 415, thus causing arm B to extend and arm A to retract. Drivesection 190 has a processor 440 and a memory 445 for storing thelocations of processing modules 125, load lock A 135, and load lock B140.

Returning to FIG. 1, drive section 190 is rotatably mounted on vacuumsection 110, and thus is capable of using arm A or arm B to placesubstrates in any of processing modules 125, in load lock A 135, or inload lock B.

In accordance with the present invention, a technique will now bedescribed for correcting for errors and changes in component locations,and to provide for more exact positioning of substrates in substrateprocessing apparatus 100. The technique includes adjusting alignercalibration factor 310 to synchronize the aligner's eccentricitydistance measurement to the radial motion of ATM robot 120. Then, thecoordinate systems of aligner 145 and VAC robot 130 are synchronizedusing ATM robot 120. The VAC robot coordinates of load lock A 135 andload lock B 140 are also synchronized.

Thus, various coordinate systems used in substrate processing apparatus100 are synchronized, that is, calibrated to each other so that uponmeasuring a distance or determining location coordinates, each systemobtains substantially the same result. When the various coordinatesystems are synchronized, the coordinates of processing modules 125,used by VAC robot 130 are corrected, that is, the previously storedcoordinates are updated in accordance with the synchronized coordinatesystem of VAC robot 130.

The technique to provide for more exact positioning of substrates may beperformed under the direction of controller 170.

Referring to FIG. 5, the aligner calibration factor adjustment procedurecommences when, under the direction of controller 170 (see also FIG. 1),ATM robot 120 places substrate 215 on supporting chuck 200 of aligner145 in step 500. Aligner 145 performs an alignment procedure in step 505as described above and eccentricity distance e_(D) and eccentricityangle e_(θ) are conveyed to ATM robot 120 in step 510. ATM robot 120repositions substrate 215 on supporting chuck 200 so that it is inalignment in step 515. This alignment and repositioning may be repeateda number of times if desired as shown in step 520.

ATM robot 120 then picks substrate 215 with a positive radial offset D+and returns substrate 215 to aligner 145 in step 525. In step 530aligner 145 performs an alignment procedure and controller 170 storeseccentricity distance e_(D) as R_plus in memory 178. Aligner 145 againperforms an alignment procedure in step 540 and eccentricity distancee_(D) and eccentricity angle e_(θ) are conveyed to ATM robot 120 in step545. In step 550 ATM robot 120 repositions substrate 215 on supportingchuck 200 so that it is in alignment. This alignment and repositioningmay be repeated a number of times if desired as shown in step 555.

ATM robot 120 then picks substrate 215 with a negative radial offset D−and returns substrate 215 to aligner 145 in step 560. In this embodimentD+ is equal to about +2540 microns and D− is equal to about −2540microns. In alternate embodiments, any suitable offset may be used.Aligner 145 performs an alignment procedure and controller 170 storeseccentricity distance e_(D) as R_minus in memory 178 in step 575.Controller 178 retrieves aligner calibation factor 310 (see FIG. 3) frommemory 305 and stores it in memory 178 as CAL_OLD in step 580. In step585 controller 178 calculates a new calibration factor, CAL_NEW usingthe following equations:CAL_NEW=CAL_OLD/SLOPEwhereSLOPE=(R_plus+R_minus)/2000

The value of CAL_NEW is stored as aligner calibration factor 310 inmemory 305. The aligner calibration factor adjustment procedure isrepeated until CAL_NEW/CAL_OLD is less than a certain threshold, in thisembodiment approximately 1%, as shown in step 590.

Turning now to FIG. 6, the technique to provide for more exactpositioning of substrates continues with the synchronization of thecoordinate systems of aligner 145 and VAC robot 130. In step 600,aligner 145 performs an alignment procedure on substrate 215, and instep 605, eccentricity distance e_(D) and eccentricity angle e_(θ) areconveyed to ATM robot 120. ATM robot 120 repositions substrate 215 onsupporting chuck 200 so that it is in alignment in step 610. Thisalignment and repositioning may be repeated a number of times if desiredas shown in step 615. ATM robot 120 then places substrate 215 in loadlock A 135 in step 620. As shown in step 625, arm A of VAC robot 130picks substrate 215 and places it in load lock A 135 with a positiveradial offset F+. In this embodiment, F+ is equal to 100 mils, however,any suitable offset may be used. In step 630 ATM robot 120 pickssubstrate 215 from load lock A and places it on supporting chuck 200.Aligner 145 performs a scan procedure as shown in step 635. In step 643controller 170 requests the scan results from aligner 145, storeseccentricity distance e_(D) as A_RO_Recc, and stores eccentricity anglee_(θ) as A_RO_Tecc in memory 178.

Aligner 145 performs an alignment procedure on substrate 215 in step 645and eccentricity distance e_(D) and eccentricity angle e_(θ) areconveyed to ATM robot 120 in step 650. ATM robot 120 repositionssubstrate 215 on supporting chuck 200 so that it is in alignment in step655. As shown in step 660, this alignment and repositioning may berepeated a number of times if desired.

In step 665, ATM robot 120 then places substrate 215 back in load lock A135. In step 670, arm A of VAC robot 130 picks substrate 215 and placesit in load lock A 135 with a positive tangential offset H+. In thisembodiment, H is equal to 0.2 degrees, although any suitable offset maybe used. Atmospheric substrate transport apparatus 215 picks substrate215 from load lock A and places it on supporting chuck 200 in step 675.In step 680, aligner 145 performs a scan procedure. Controller 170requests the scan results from aligner 145 and stores eccentricitydistance e_(D) as A_TO Recc and stores eccentricity angle e_(θ) asA_TO_Tecc in memory 178 as shown in step 685. A_RO_Recc, A_RO_Tecc,A_TO_Recc, and A_TO_Tecc are used to adjust the coordinate system of VACrobot 130 as will be described below.

Referring to FIG. 7, it can be seen that a substantially similarsynchronization of the coordinate systems of aligner 145 and VAC robot130 is performed using arm B of VAC robot 130. For example, in step 740,controller 170 stores the resulting eccentricity distance e_(D) andeccentricity angle e_(θ) for the radial offset as B_RO_Recc andB_RO_Tecc, respectively, in memory 178. Step 785 shows that controller170 stores the resulting eccentricity distance e_(D) and eccentricityangle e_(θ) for the tangential offset as B_TO_Recc and B_TO_Tecc,respectively, also in memory 178.

The technique to provide for more exact positioning of substratescontinues with the synchronization of the VAC robot coordinates of loadlock A 135 and load lock B 140. Turning now to FIG. 8, ATM robot 120again places substrate 215 on supporting chuck 200 in step 800. Aligner145 performs an alignment procedure on substrate 215 as shown in step805. In step 810, eccentricity distance e_(D) and eccentricity anglee_(θ) are conveyed to ATM robot 120 which, in step 815, repositionssubstrate 215 on supporting chuck 200 so that it is in alignment. Asshown in step 820, this alignment and repositioning may be repeated anumber of times if desired. In step 825, ATM robot 120 then placessubstrate 215 in load lock B 140.

To synchronize the coordinates of load lock A 135 and load lock B 140for arm A, controller 170 begins by causing VAC robot 130, in step 830,to pick substrate 215 with arm A and place it in load lock A. In step835, ATM robot 120 picks substrate 215 from load lock A 135 and placesit on supporting chuck 200. Aligner 145 performs a scan procedure instep 840. In step 845, controller 170 requests the scan results fromaligner 145 and stores eccentricity distance e_(D) as A_LLB_Recc andstores eccentricity angle e_(θ) as A_LLB_Tecc in memory 178.

As shown in step 850, if eccentricity distance e_(D) (A_LLB_Recc) isless than a particular threshold, in this embodiment approximately 1mil, the coordinates of load lock A and B are considered synchronizedfor arm A and the correction technique proceeds to synchronize thecoordinates for arm B.

If eccentricity distance e_(D) (A_LLB_Recc) is equal to or more than aparticular threshold, in this embodiment approximately 1 mil, controller170 retrieves previously stored arm A coordinates for load lock B,A_LLB_R_OLD and A_LLB_T_OLD, from memory 445 as shown in step 855. Instep 860, controller 170 then calculates new coordinates for load lock Bwhen accessed by arm A, A_LLB R_NEW and A_LLB_T_NEW, using the followingequations:A _(—) LLB _(—) R_NEW=A _(—) LLB _(—) R_OLD+(2540/A _(—) RO _(—)Recc)*ΔR _(—) A _(—) LLBwhereΔR _(—) A _(—) LLB=A _(—) LLB _(—) Recc*cos [(A _(—) LLB _(—) Tecc−A_(—) RO _(—) Tecc)*3.14/1800]andA _(—) LLB T_NEW=A _(—) LLB _(—) T_OLD+(200/A _(—) TO _(—) Recc)*ΔT _(—)A _(—) LLBwhereΔT _(—) A _(—) LLB=A _(—) LLB _(—) Recc*sin [(A _(—) LLB _(—) Tecc−A_(—) RO _(—) Tecc)*3.14/1800]

In step 870, controller 170 then stores A_LLB_R_NEW and A_LLB_T_NEW ascoordinates for load lock B 140 for arm A in memory 445. Controller 170repeats the synchronization of the coordinates of load lock A 135 andload lock B 140 for arm A until the eccentricity distance e_(D)(A_LLB_Recc) returned from aligner 145 is less than approximately 1 mil.

Referring now to FIG. 9, controller 170 synchronizes the coordinates ofload lock A 135 and load lock B 140 for arm B using a similar procedure.In step 900, ATM robot 120 places substrate 21.5 on supporting chuck200. In step 905, aligner 145 performs an alignment procedure onsubstrate 215. The resulting eccentricity distance e_(D) andeccentricity angle e_(θ) are conveyed to ATM robot 120 in step 910 whichrepositions substrate 215 on supporting chuck 200 in an alignmentposition as shown in step 915. As shown in step 920, this alignment andrepositioning may be repeated a number of times if desired. ATM robot120 then places substrate 215 in load lock B 140 in step 925. Controller170 then causes VAC robot 130 to pick substrate 215 with arm B and placeit in load lock A in step 930. ATM robot 120 picks substrate 215 fromload lock A 135 and places it on supporting chuck 200 in step 935. Asshown in step 940, aligner 145 performs a scan procedure. In step 945,controller 170 requests the scan results from aligner 145 and storeseccentricity distance e_(D) as B_LLB_Recc, and stores eccentricity anglee_(θ) as B_LLB_Tecc in memory 178.

As shown in step 950, if eccentricity distance e_(D) (B_LLB_Recc) isless than a particular threshold, for example approximately 1 mil, thecoordinates of load lock A and B are considered synchronized for arm Band the correction technique proceeds to correct the coordinates ofprocessing modules 125.

If eccentricity distance e_(D) (B_LLB_Recc) is equal to or more than acertain threshold, for example approximately 1 mil, step 955 shows thatcontroller 170 retrieves previously stored arm B coordinates for loadlock B, B_LLB_R_OLD and B_LLB_T_OLD, from memory 445. In step 960,controller 170 then calculates new coordinates for load lock B whenaccessed by arm B, B_LLB_R_NEW and B_LLB_T_NEW, using the followingequations:B _(—) LLB _(—) R_NEW=B _(—) LLB _(—) R_OLD+(2540/B _(—) RO _(—)Recc)*ΔR_(—) B _(—) LLBwhereΔR _(—) B _(—) LLB=B _(—) LLB _(—) Recc*cos [(B _(—) LLB _(—) Tecc−B_(—) RO _(—) Tecc)*3.14/1800]andB _(—) LLB _(—) T_NEW=B _(—) LLB _(—) T_OLD+(200/B _(—) TO _(—) Recc)*ΔT_(—) B _(—) LLBwhereΔT _(—) B _(—) LLB=B _(—) LLB _(—) Recc*sin [(B _(—) LLB _(—) Tecc−B_(—) RO _(—) Tecc)*3.14/1800]

In step 970, controller 170 then stores B_LLB R_NEW and B_LLB_T_NEW ascoordinates for load lock B 140 for arm B in memory 445. Controller 170repeats the synchronization of the arm B coordinates of load lock A 135and load lock B until the returned eccentricity distance e_(D) orB_LLB_Recc is less than approximately 1 mil.

Turning now to FIG. 10, the technique to provide for more exactpositioning of substrates then proceeds to correct the VAC robotcoordinates of processing modules 125. The embodiment of substrateprocessing apparatus 100, shown in FIG. 1, has six processing modules125, designated as PM1, PM2, . . . PM6. The coordinates for eachprocessing module PM1, PM2, . . . PM6, are corrected for each arm, A andB, of VAC robot 130. In step 1000, correction of arm A coordinatesbegins by placing substrate 215 in the desired position of processingmodule PM1. In step 1005, controller 170 then causes arm A of VAC robot130 to pick substrate 215 from processing module PM1 and place it inload lock A 135. In step 1010, ATM robot 120 picks substrate 215 andplaces it on supporting chuck 200, and in step 1015, aligner 145performs a scan procedure. Controller 170 then requests the scan resultsand stores eccentricity distance e_(D) as A_PM1_Recc and eccentricityangle e_(θ) as A_PM1_Tecc in memory 178 as shown in step 1020.

If eccentricity distance e_(D) (A_PM1_Recc) is less than a certainthreshold, in this example approximately 1 mil, the coordinates for thatparticular processing module are considered correct and the correctiontechnique proceeds to the next module as shown in step 1025.

Step 1040 shows that if eccentricity distance e_(D) (A_PM1_Recc) isequal to or greater than a certain value, for example approximately 1mil, controller 170 retrieves the present arm A coordinates ofprocessing module PM1 from memory 445 of VAC robot 130. The coordinatesare stored as A_PM1_R_OLD and A_PM1_T_OLD. In step 1045, controller 170calculates new arm A coordinates A_PM1_R_NEW and A_PM1_T_NEW forprocessing module PM1 using the following equations:A _(—) PM 1 _(—) R_NEW=A _(—) PM 1 _(—) R_OLD+(2540/A _(—) RO _(—)Recc)*ΔR _(—) A _(—) PM 1whereΔR _(—) A _(—) PM 1=A _(—) PM 1 _(—) Recc*cos [(A _(—) PM 1 _(—) Tecc−A_(—) RO _(—) Tecc)*3.14/1800]andA _(—) PM 1 _(—) T_NEW=A _(—) PM 1 _(—) T_OLD+(200/A _(—) TO _(—)Recc)*ΔT _(—) A _(—) PM 1whereΔT _(—) A _(—) PM 1=A _(—) PM 1 _(—) Recc*sin [(A _(—) PM 1 _(—) Tecc−A_(—) RO _(—) Tecc)*3.14/1800]

Controller 170 stores the new arm A coordinates for processing modulePM1, A_PM1_R_NEW and A_PM1_T_NEW, in memory 445 of VAC robot 130.

The correction of arm A VAC robot coordinates of processing module PM1is repeated until the eccentricity distance e_(D) (A_PM1_Recc) returnedfrom aligner 145 is less than approximately 1 mil.

The correction procedure for arm A coordinates is then repeated for eachprocessing module PM2, PM3, . . . PM6 as shown in steps 1030 and 1035.

FIG. 11 shows that correction of arm B coordinates proceeds in a similarmanner. In step 1100, substrate 215 is placed by hand in the desiredposition of PM1.

Alternatively, ATM robot 120 places substrate 215 on supporting chuck200. Aligner 145 performs an alignment procedure on substrate 215. Theresulting eccentricity distance e_(D) and eccentricity angle e_(θ) areconveyed to ATM robot 120 which repositions substrate 215 on supportingchuck 200 in an alignment position. This alignment and repositioning maybe repeated a number of times if desired. ATM robot 120 then placessubstrate 215 in load lock A 135. In accordance with step 1100,controller 170 then causes VAC robot 130 to pick substrate 215 with armA and place it in processing module PM1.

Once substrate 215 has been accurately placed in processing module PM1,controller 170 causes arm B to pick substrate 215 from processing modulePM1 and place it in load lock A 135 as shown in step 1105. In step 1110,ATM robot 120 picks substrate 215 and places it on supporting chuck 200where, in step 1115, aligner 145 performs a scan procedure. Controller170 then requests the scan results and stores eccentricity distancee_(D) as B_PM1_Recc and eccentricity angle e_(θ) as B_PM1_Tecc in memory178 as shown in step 1120.

As shown in step 1125, if eccentricity distance e_(D) (B_PM1_Recc) isless than a particular value, in this embodiment approximately 1 mil,the coordinates for that particular processing module are consideredcorrect and the correction technique proceeds to the next module.

If eccentricity distance e_(D) (B_PM1_Recc) is equal to or greater thana particular value, in this example approximately 1 mil, controller 170retrieves arm B's present coordinates for processing module PM1 frommemory 445 and stores them as B_PM1_R_OLD and B_PM1_T_OLD as shown instep 1140. In step 1145, controller 170 calculates new coordinates ofprocessing module PM1 for arm B, B_PM1_R_NEW and B_PM1_T_NEW using thefollowing equations:B_(—) PM 1 _(—) R_NEW=B _(—) PM 1 _(—) R_OLD+(2540/B _(—) RO _(—)Recc)*ΔR _(—) B _(—) PM 1whereΔR _(—) B _(—) PM 1=B _(—) PM 1 _(—) Recc*cos [(B _(—) PM 1 _(—) Tecc−B_(—) RO _(—) Tecc)*3.14/1800]andB _(—) PM 1 _(—) T_NEW=B _(—) PM 1 _(—) T_OLD+(200/B _(—) TO _(—)Recc)*ΔT _(—) B _(—) PM 1whereΔT _(—) B _(—) PM 1=B _(—) PM 1 _(—) Recc*sin [(B _(—) PM 1 _(—) Tecc−B_(—) RO _(—) Tecc)*3.14/1800]

Controller 170 stores the new coordinates of processing module PM1 forarm B, B_PM1_R_NEW and B_PM1_T_NEW, in memory 445 of VAC robot 130.

The correction of coordinates of processing module PM1 for arm B isrepeated until the eccentricity distance e_(D) (B_PM1_Recc) returnedfrom aligner 145 is less than approximately 1 mil.

Steps 1130 and 1135 show that the correction of processing modulecoordinates for arm B is repeated for each processing module PM2, PM3, .. . PM6.

Completion of the technique to provide for more exact positioning ofsubstrates results in ATM robot 120, aligner 145, and VAC robot 130operating together to position substrates more precisely in substrateprocessing apparatus 100. This is because aligner correction factor 310and the radial motion of ATM robot 120 are more closely synchronized, asare the coordinate systems of aligner 145 and VAC robot 130. Thetechnique also results in a close synchronization of the coordinates ofload lock A 135 and load lock B. After the various alignment systems andcoordinates are synchronized, the coordinates for processing modulesPM1, PM2, . . . PM6, used by VAC robot 130 are corrected to a highdegree of accuracy.

Controller 170 is disclosed in the context of a stand alone device withprocessor 173 and memory 178. It should be understood that controller170 may be implemented in any combination of hardware and softwaresuitable for providing control functions for substrate processing system100. It should also be understood that controller 170 may be a selfcontained device or may be a distributed device, for example, acombination of processes and circuitry connected by a network.

While VAC robot 130 is described in the context of having dual arms, Aand B, processor 44d and memory 445, it should be understood that VACrobot 130 may be of any configuration suitable for transportingsubstrates within substrate processing apparatus 100.

Aligner 145 is disclosed as including supporting chuck 200, radiationsource 210, and radiation detector 205, all controlled by controlcircuitry 225. However, aligner 145 may be any mechanism capable ofdetecting and conveying misalignment information to ATM robot 120 or VACrobot 130.

Substrate processing apparatus 100 is shown as having six processingmodules 126 (PM1 . . . PM6) positioned around the periphery of centralchamber 175. However, it should be understood that substrate processingapparatus 100 may have any number of processing modules 126 and they maybe in any location accessible by at least one of ATM robot 120 or VACrobot 130.

Thus, the present invention results in a substrate processing systemthat provides for more exact positioning of substrates. The presentinvention provides for more exact positioning by adjusting an alignercalibration factor to synchronize aligner calibration with a radialmotion of a first substrate transport apparatus, and also provides forsynchronizing a coordinate system of the aligner with a coordinatesystem of a second substrate transport apparatus. In addition, thesecond substrate transport apparatus' coordinates are synchronized toload locks in the system, and to correct processing module coordinates.

It should be understood that the foregoing description is onlyillustrative of the invention. Various alternatives and modificationscan be devised by those skilled in the art without departing from theinvention. Accordingly, the present invention is intended to embrace allsuch alternatives, modifications and variances which fall within thescope of the appended claims.

1. A substrate transport apparatus auto-teach system for auto-teaching asubstrate station location, the system comprising: a frame; a substratetransport apparatus movably connected to the frame and having anassociated transport apparatus coordinate system; an aligner connectedto the frame; and a control system operably connected to the transportapparatus and programmed to position with the transport apparatus, anobject on the aligner, and to measure with the aligner a spatialrelationship between the object and the aligner; wherein the controlsystem is programmed with first spatial coordinates, within thetransport apparatus coordinate system, identifying a location of thesubstrate station, and the program is arranged to combine the firstspatial coordinates and the measured spatial relationship to generatesecond spatial coordinates identifying the location of the substratestation.